ISOTOPE ENRICHMENT METHOD Russian patent published in 2010 - IPC B01D59/32 C01B33/02 C01B33/107

Abstract RU 2399409 C2

FIELD: chemistry.

SUBSTANCE: present invention relates to a silicon isotope enrichment method used in semiconductor materials, in optics and other similar fields. The isotope enrichment method involves a step for isotope exchange between an aqueous solution which contains at least two components, each having a formula H₂O-H₂SiF₆·nSiF₄ (where n≥0) and a gas which contains SiF₄ for enrichment of a stable Si isotope.

EFFECT: disclosed method enables to obtain isotope-enriched silicon on a large scale, method does not require explosion hazardous equipment, low cost of equipment and the process is highly safe.

3 cl, 5 dwg

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RU 2 399 409 C2

Authors

Vaki Masakhide

Mijamoto Kazukhiro

Dates

2010-09-20—Published

2006-09-08—Filed