METHOD AND DEVICE OF APPLYING UNIFORM THIN FLUID LAYER ONTO SUBSTRATES Russian patent published in 2010 - IPC H01L21/00 B05C9/08 

FIELD: electrical engineering.

SUBSTANCE: device (10) to apply uniform thin layer of fluid, form example, phosphoric acid on substrates (12), particularly on silicon elements intended for photoelectric applications, comprises working chamber (14) with fluid vessel (16) and high-frequency ultrasound device (11) transforming fluid into its vapors (15), conveyor (13) arranged under fluid vapor discharge channel (25) of aforesaid chamber (14). To produce above described device (10), inner cross section of fluid vapor discharge channel (25) of chamber (14) gets narrowing toward conveyor (13) to come into through channel (40) for substrates (12) that covers conveyor (13). Note here that inner cross section of fluid vapor discharge channel (25) and that of through channel (40) are, preferably, equal.

EFFECT: possibility to apply fluid uniformly on surface area and through volume of said silicon elements.

22 cl, 2 dwg