DEVICE FOR INJECTING GAS INTO RESERVOIR Russian patent published in 2011 - IPC F27D7/00 C21B11/00 C21B13/00 

FIELD: machine building.

SUBSTANCE: device for injection of gas into metallurgical reservoir consists of channel for gas flow, elongated central device passing inside channel for gas flow from its back end to front end, of multitude of blades directing flow; also, blades are arranged around central device next to front end of channel for swirling gas flow. Further, the device consists of passages for cooling water supply and withdrawal. In the device a circular head of the channel at the front end of the channel has an internal passage for cooling water connected with passages for cooling water supply and withdrawal to cool the channel head from inside. The blades directing flow are assembled on the central device so, that they pass along the central device from the back end to the front end and their dimension ensures their front end contact with the supporting them head of the channel cooled with water from inside. The further back part of the channel head has a circular back wall running from internal periphery wall of the head. Also, the back wall of the head has a deformed corrugation to receive radial load on the wall at contact with front ends of the blades located inside the further back part of the channel head to contact only the further back part of the channel head.

EFFECT: raised reliability of device operation under conditions of high temperature.

9 cl, 9 dwg