FIELD: metallurgy.
SUBSTANCE: film contains phosphate, silicon dioxide, compound of manganese and compound of potassium. Also, phosphate contains at least one or more elements chosen from group consisting of Al, Mg, Ni, Mn, Co, Mo, Zr, Sr and Ca. Film has a composition containing 100 weight shares of phosphate as solid substance, from 20 to 80 weight shares of silicon dioxide as solid substance, from 0.5 to 15 weight shares of compound of manganese different from manganese phosphate, evident as manganese dioxide, while mole ratio K/Mn potassium to manganese contained in compound of manganese different from manganese phosphate is from 0.02 to 2.0. The procedure for manufacture of the said sheet consists in application of solution containing phosphate, silicon dioxide, compound of manganese and compound of potassium on its surface. Upon completion of finish annealing, the procedure further consists in solution drying and heating in temperature range from 800°C and higher and from 1000°C and lower to form oxide film.
EFFECT: excellent resistance to annealing and good magnetic characteristics.
3 cl, 8 tbl, 5 ex
