ELECTRON BEAM LITHOGRAPHY Russian patent published in 2012 - IPC H01J37/73 

Abstract RU 2462784 C1

FIELD: physics.

SUBSTANCE: method is realised by transferring an image from a mask-cathode using secondary electron emission electrodes onto a resist whose substrate is connected to an anode. The invention is characterised by that the process chamber is filled with a working gas and a glow discharge is formed in the cathode region using an additional electrode which is electrically connected to the anode. The mask-cathode is made from materials different secondary ion-electron emission coefficients. Parameters of the glow discharge are selected based on the condition that secondary ion-electron emission occurs from both materials of the mask-cathode.

EFFECT: longer service life of the mask-cathode.

2 cl, 4 dwg

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RU 2 462 784 C1

Authors

Margolin Vladimir Igorevich

Mamykin Aleksandr Ivanovich

Potekhin Maksim Sergeevich

Tupik Viktor Anatol'Evich

Shelud'Ko Viktor Nikolaevich

Dates

2012-09-27Published

2011-03-31Filed