PLASMA SYSTEM Russian patent published in 2013 - IPC H01J37/32 

Abstract RU 2476953 C2

FIELD: chemistry.

SUBSTANCE: sampling surfaces of tubular bases can be treated in order to deposit thin films of a desired substance, where one of the electrodes used in the plasma system is formed by the base or workpiece.

EFFECT: allowing smaller size of the plasma reactors used.

8 cl, 7 dwg

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RU 2 476 953 C2

Authors

Biana Rikardo Ehnrike

Dates

2013-02-27Published

2008-03-12Filed