FIELD: measurement equipment.
SUBSTANCE: in the method to monitor life time of minority charge carriers in silicon bars, including heating of an object, illumination of an object with a pulse exciting beam L1 (wave length λ1=1.15hr 1.28 mcm) and a probing beam L2 (wave length λ1<λ2≤6.0 mcm), crossing of beams L1 and L2, inside the object, registration of the beam L2 that passed through the object, measurement of time dependence of intensity of the beam L2 that passed through the object with subsequent determination of life time of minority charge carriers for a coordinate of a crossing point of beams L1 and L2, scanning of the object volume with the specified area of crossing and detection of life time of minority charge carriers for scanned areas, illumination of the object with the beam L1 is carried out at the side of the lateral surface of the object, besides, illumination is carried out via a focusing lens, the beam L1 is focused in the object volume, and scanning of the object volume is carried out with the area of crossing of the beam L2 with the focus of the beam L1.
EFFECT: increased accuracy and increased efficiency of the method to measure life time of minority charge carriers in process of non-destructive layerwise survey of its distribution in silicon bars.
1 dwg
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Authors
Dates
2013-06-27—Published
2012-01-31—Filed