FIELD: measurement equipment.
SUBSTANCE: in the measurement method of life cycle of minor charge carriers in silicon, which involves heating of a silicon ingot to the temperature of not less than 80°C, lighting of the ingot end with pulse exciting beam L1 with wave length λ1=1.15+1.28 mcm and lighting of side surface of the ingot with sounding beam L2 with wave length λ1<λ2≤6.0 mcm, crossing of beams L1 and L2 inside the ingot, recording of beam L2 that passed through the ingot, measurement of time dependence of intensity of beam L2 that passed through the ingot with further determination of life cycle of minor charge carriers for coordinate of a cross point of beams L1 and L2 and scanning of volume of the ingot with the above intersection area and determination of life time of minor charge carriers for scanned areas. Lighting of the ingot with beam L1 is performed through a flat focusing lens, a flat focus of beam L1 is located in the intersection plane of beams L2, and scanning of the ingot volume is performed with the intersection area of beams L2 with focus of beam L1.
EFFECT: increasing productivity of the measurement method of life cycle of minor charge carriers during non-destructive layer-by-layer investigation of its distribution in silicon ingots.
2 cl, 1 dwg
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Authors
Dates
2013-06-10—Published
2012-01-31—Filed