SPUTTERING UNIT OF COATINGS ONTO PRECISION PARTS OF ASSEMBLIES OF GYROSCOPIC INSTRUMENTS Russian patent published in 2014 - IPC C23C14/50 B05C13/00 

FIELD: metallurgy.

SUBSTANCE: sputtering target creates an annular zone of an evaporated material flow with average diameter D_m. Holders with attachment assemblies of sputtered parts are installed on stocks in the quantity of n. Stocks are rotated at angular speed w₁ in one direction, and a reduction unit is rotated at angular speed w₂ in another direction and the above stocks are arranged on it uniformly at equal distance of 1/2·D_m from its rotation axis. A plane in which centres of attachment assembles of parts lie is inclined to the symmetry axis of that flow at an angle for the purpose of more optimum orientation of working surfaces to the sputtered material flow. In order to provide constant movement conditions of parts in an evaporated material zone, holders in which parts are installed are made in the form of cantilever elements with displacement of a centre of the attachment assembly of each part relative to the stock axis. For one pair of opposite lying stocks located on a longer axis of an elliptical trajectory of their movement, displacement direction L is oriented to the ellipse centre, and for the second pair of opposite lying stocks located on a shorter axis of that trajectory displacement direction L is oriented to the side that is opposite to the centre of the above ellipse.

EFFECT: improving quality and functional characteristics of sputtered coatings.

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