FIELD: technological processes.
SUBSTANCE: invention relates to coatings ion-plasma sputtering on items in vacuum method and device for its implementation and can be used in metallurgy, plasma chemistry and machine-building industry. Items are placed inside plasma device comprising target from sputtered material. Performing imposition of configured electric and magnetic fields under conditions of glowing plasma discharge, plasma flow compression and its local focusing in target top center to form local plasma spot within 1 mm2 on its surface. Device includes plasma cell placed inside vacuum chamber and during operation filled with plasma-forming gas. Cell is formed between two parallel arranged plates and comprises aligned cathode, target from sprayed material, anode and focusing electrodes. Cathode is made in form of rod-shaped target holder. Sputtering items are fixed in one of focusing electrodes. Cathode with target is installed inside hollow cylindrical magnet having axial magnetization.
EFFECT: result is production of high quality coating while reducing device power consumption.
2 cl, 2 dwg
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Authors
Dates
2017-01-10—Published
2015-06-17—Filed