FIELD: process engineering.
SUBSTANCE: proposed device comprises multifluidal channels or chambers composed by, at least partially, at feeding appropriate structure to the film under substrate holder so that at least a portion of fluid flows through the screen in substrate plane. To form stable channel and chamber structure in the film in edge zone between secured and free parts, material wedge is formed owing to film material viscose flow in attachment of said film to substrate which makes the transition between chamber wall and substrate to lift the chamber wall above substrate plane. In compliance with proposed process, flat planar film is laminated to flat sheet-like substrate. In lamination, pattern with at least one recess or opening is embedded by pressure and heat into film and substrate. Note that film is heated to temperature whereat film and substrate material produce viscose flow in the area of said recess or opening to form the material wedge and to bulge the film in recess or opening area so that chamber results.
EFFECT: simplified process without preliminary structure formation.
14 cl, 15 dwg
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Authors
Dates
2014-05-10—Published
2009-06-02—Filed