SUPPORT STRUCTURE OF SUBSTRATE, PRESSING PREPARATORY UNIT AND UNIT FOR LITHOGRAPHY Russian patent published in 2015 - IPC G03F7/00 G03F7/20 H01J37/20 

Abstract RU 2552595 C2

FIELD: printing.

SUBSTANCE: invention relates to the field of lithography and relates to a support structure of the substrate. Pressing the substrate to the surface of the support structure is carried by a capillary layer of liquid. The surface of the support structure has an outer edge and comprises the support elements intended for receiving a pressed substrate in multiple support locations. The support structure of the substrate additionally comprises a sealing structure which limits the surface and has an edge forming a sealing rim. The distance between the outer edge of the surface and the outermost of the support locations is greater than the distance between the outer edge of the surface and the sealing rim. The distance between the sealing rim and the outermost location of the support is greater than the maximum distance between the adjacent support locations.

EFFECT: technical result consists in increasing clamping force, reduction of contamination of the vacuum environment and increase in the lifetime of the device.

15 cl, 30 dwg

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RU 2 552 595 C2

Authors

De Jong Khendrik Jan

Dates

2015-06-10Published

2011-02-18Filed