FIELD: chemistry.
SUBSTANCE: invention relates to method of siliceous film formation. In accordance with claimed method, siliceous film, which has hydrophilic surface, can be formed from polysilazane compound at low temperature. In claimed method composition, containing polysilazane compound and accelerator of reaction of silicon oxide conversion, is applied on substrate surface with formation of polysilazane film, after which solution for polysilazane film processing is applied on it in such a way that polysilazane compound can be converted into polysilazane film at 300°C or lower. Solution for polysilazane film processing contains solvent, hydrogen peroxide and alcohol.
EFFECT: invention makes it possible to obtain dense siliceous film with hydrophilic properties at relatively low temperature.
7 cl, 2 tbl
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