METHOD FOR CHEMICAL-MECHANICAL POLISHING OF GALLIUM ARSENIDE PLATES Russian patent published in 2015 - IPC C30B33/00 H01L21/304 H01L21/306 C30B29/42 

Abstract RU 2545295 C1

FIELD: chemistry.

SUBSTANCE: method includes treating plates with a rotating polisher and a polishing composition, which additionally contains tartaric acid as a complexing agent and ethylene glycol as a lubricant, with the following content of components, vol %: hydrogen peroxide - 7.0-70.0, 30% aqueous tartaric acid solution - 7.0-60.0, ethylene glycol - 5.0-15.0, deionised water - the balance.

EFFECT: single-step treatment using a polishing composition which is abrasive free, high quality of the treated material by reducing surface defects thereof.

2 dwg, 1 tbl, 3 ex

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RU 2 545 295 C1

Authors

Kiseleva Larisa Vasil'Evna

Boltar' Konstantin Olegovich

Vlasov Pavel Valentinovich

Eremchuk Anatolij Ivanovich

Efimova Zinaida Nikolaevna

Lopukhin Aleksej Alekseevich

Savostin Aleksandr Viktorovich

Dates

2015-03-27Published

2014-02-03Filed