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2 007 784

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IPC

(21) (22)

Application

4927599/25, 1991-04-16

(22)

Actual filing date

1991-04-16

(45)

Published

1994-02-15

(72)

Inventor

Rogov V.V.Zakaznova V.D.Tjun'Kova Z.V.Erusalimchik I.G.

(73)

Holder

Rogov Vladimir ViktorovichZakaznova Vera DmitrievnaTjun'Kova Zoja Vasil'EvnaErusalimchik Iosif Grigor'Evich

PROCESS OF POLISHING SEMICONDUCTOR PLATES Russian patent published in 1994 - IPC

Abstract RU 2007784 C1

FIELD: electronics. SUBSTANCE: process includes action of rotating polisher and abrasive compound with viscosity 4-8 1m² with loading on bonded plates. Lavsan cloth is used as polisher. Polishing of plates is conducted at linear speed of point of polisher coinciding with position of center of cassettes equal to 0.75-1.40 m/s, with consumption rate of abrasive compound not less than 1.2 ml/s per 1.0 sq. m and with pressure of 2.5-5.0 kPa on plates. EFFECT: improved quality of polishing. 1 tbl

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RU 2 007 784 C1

Authors

Rogov V.V.

Zakaznova V.D.

Tjun'Kova Z.V.

Erusalimchik I.G.

Dates

1994-02-15—Published

1991-04-16—Filed