COMPLEX OF GAS CLEANING PLANTS Russian patent published in 2015 - IPC C21B7/22 C21C5/40 F27B3/10 

Abstract RU 2557840 C1

FIELD: metallurgy.

SUBSTANCE: complex includes independent gas cleaning plants, the gas outlet path of each of which includes a duct for gas to be cleaned, a gas cleaning apparatus equipped with devices for accumulation and removal of the collected dust, a clean gas duct, a thrust agitator and a stack. Shutoff valves are installed on ducts for gas to be cleaned in front of gas cleaning apparatus and on clean gas ducts after gas cleaning apparatus. Neighbouring ducts for gas to be cleaned in sections located between shutoff valves and gas cleaning apparatus are connected to each other with an additional gas duct with a shutoff valve, and neighbouring clean gas ducts in sections located between gas cleaning apparatus and shutoff valves are connected to each other with an additional gas duct with a shutoff valve.

EFFECT: improving operating efficiency of a complex of gas cleaning plants.

4 cl, 1 dwg

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RU 2 557 840 C1

Authors

Stalinskij Dmitrij Vital'Evich

Mantula Vadim Dmitrievich

Dunaev Aleksandr Vasil'Evich

Lavoshnik Aleksandr Semenovich

Viniarz Jatsek

Kotynskij Dmitrij Aleksandrovich

Dates

2015-07-27Published

2014-01-10Filed