METHOD TO DETERMINE THICKNESS OF METAL FILMS Russian patent published in 2015 - IPC G01B11/06 

FIELD: measurement equipment.

SUBSTANCE: in process of layer formation they measure ellipsometric parameters Δ and ψ. Previously using the ellipsometric method they determine the refraction index of a transparent substrate n₁ with rear matte surface with the help of a laser ellipsometer with wave length of 0.6328 mcm. Onto polished surfaces of transparent substrates they apply metal films, substrates are illuminated with a laser beam at the side of the applied beam, selecting samples that transmit the laser beam, using the laser ellipsometer with wave length of 0.6328 mcm they measure ellipsometric parameters Δ and ψ of the film, which does not transmit the laser beam, and calculate for it, using a software and hardware facility connected to an ellipsometer, the optical constants of the film - refraction index n and coefficient of extinction k, and the reference dependence is formed in the form of a function Δ=f(ψ) using n₁ and the film refraction index n and the coefficient of extinction k. Experimentally they determine ellipsometric parameters Δ_exp and ψ_exp for semi-transparent films that transmit the laser beam, results of experimental values are fixed in the plane for comparison with the reference dependence Δ=f(ψ).

EFFECT: provision of accuracy of metal film thickness and quality detection.

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