PROCEDURE MEASURING THICKNESS OF RESIDUAL FILMS IN SMALL-SIZE WINDOWS Russian patent published in 2002 - IPC

FIELD: optical instrumentation. SUBSTANCE: procedure can be used to measure thickness of residual films in small-size windows approximately 1 μm, won by any process in unspecified multilayer structure on substrate with known optical characteristics. Procedure consists in measurement by standard ellipsometric method of ellipsometric parameters in zero order of diffraction for at least four sections of structure arranged nearby with windows formed in it with different ratios of areas of "initial multilayer structure-windows" with subsequent computation of thickness of residual film in windows by special algorithm. Invention provides expanded range of articles in which test of thickness of residual films in small-size windows can be realized which results in increased percentage of output of good articles. EFFECT: higher efficiency. 1 dwg, 1 tbl