FIELD: measurement technology.
SUBSTANCE: invention relates to the field of optical-physical measurements based on ellipsometry, and is intended to determine the linear thermal expansion coefficient of thin transparent films. Method of determining linear coefficient of thermal expansion of thin transparent film, at which ellipsometric parameters Δ and Ψ are measured at initial and final temperature, with subsequent determination of film thickness at initial and final temperature taking into account medium refraction indices and calculation of coefficient of thermal expansion by known formulas. At that, on amorphous quartz substrate by means of vacuum deposition film is applied, besides before film application optical parameters Δ and Ψ reflected from surface of substrate of light beam are determined at initial and final temperature, substrate with applied film is placed in water-cooled chamber installed inside ellipsometer, which design provides certain angle of light beam incidence on surface of film-substrate system, and calculating the ellipsometric parameters Δ and Ψ reflected from the surface of the light beam film-substrate system.
EFFECT: determining the linear thermal expansion coefficient of the thin transparent film with thickness less than 1 mcm.
1 cl, 1 dwg
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Authors
Dates
2019-04-02—Published
2018-06-20—Filed