FIELD: instrumentation.
SUBSTANCE: invention relates to instrumentation and describes the system of magnetic shielding of the lithograph device by beams of charged particles. The system contains the first chamber, the second chamber and the set of two coils. Walls of the first and second chambers contain the magnetic shielding material. The second chamber comprises the first chamber, the set of two coils having the common axis and located on opposite sides from the first chamber, the mobile support for the substrate holder, at least one magnetic field sensor within the second chamber, the system of control of currents in coils on the basis of the sensor data. The first chamber at least partially comprises the lithograph device and has a hole on the side facing towards the substrate holder.
EFFECT: improvement of system characteristics.
29 cl, 9 dwg
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