FIELD: process engineering.
SUBSTANCE: invention relates to lithographic system with multiple nodes. Every said node comprises lithographic device arranged in vacuum chamber for application of the pattern on the substrate, load locking system for transfer of substrates into and from the vacuum chamber and door for access to said chamber for servicing purposes. Said load locking system and the door of every node of lithographic system are arranged on one side and directed to free space on the side of lithographic system, in particular, in the servicing zone.
EFFECT: higher efficiency.
14 cl, 12 dwg
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