FIELD: physics.
SUBSTANCE: invention relates to a modulation device for modulating elementary beams of charged particles in accordance with the pattern data in a lithographic system by multiple elementary charged particle beams. The device comprises a plate housing, a grid of elementary beam deflectors, a plurality of power supply terminals (202-205) for supplying at least two different voltages, a plurality of control circuits, and a conductive plate (201) for supplying electrical power to one or more terminals (202-205) of the power supply. The plate body is divided into an elongated action zone (51) of the beams and an elongated non-action zone (52) of beams disposed adjacent to each other with their long edges. Deflectors of elementary beams are located in the range of the beams. Control schemes are located in the zone of no action of the beams. The conductive plate is connected to the control circuits in the zone of no action of the beams. The conductive plate comprises a plurality of thin conductive plates (202-205).
EFFECT: reduction of the influence of undesirable magnetic fields on charged particle beams.
17 cl, 10 dwg
