FIELD: physics.
SUBSTANCE: invention relates to system of charged particles, such as multiple-beam lithography system containing device-manipulator for manipulating one or more beams of charged particles. Declared group of systems of charged particles, besides, such as multi-beam lithography containing device-manipulator for manipulating one or more beams of charged particles, device-manipulator comprises: flat substrate having at least one through hole in plane of flat substrate, at that each through hole is made with possibility of passing at least one beam of charged particles through it, and each through hole is equipped with electrodes arranged in first set of plurality of first electrodes along first part of perimeter of said through hole and in second set of plurality second electrodes along second part of said perimeter, and electronic control circuit configured to provide voltage differences to pairs of electrodes, each pair consists of first electrode from first set and second electrode of second set, depending on position of first and second electrodes along perimeter of through hole in order to provide electric field, which is substantially uniform along entire through hole.
EFFECT: technical result consists in providing accurate location of projection of beam on manipulator and minimising any deviation from the axis of beam of charged particles.
36 cl, 7 dwg
