NETWORK ARCHITECTURE AND PROTOCOL FOR CLUSTER OF PATTERNING MACHINES Russian patent published in 2016 - IPC H01J37/317 

FIELD: physics, computation hardware.

SUBSTANCE: invention relates to cluster patterning system for substrate processing. Claimed system comprises one or more lithographic elements. Every said element allows independent substrate exposure in compliance with mask data. Every said element comprises multiple lithography subsystems, control network to transmit control data between said subsystems and at least one element control unit. Note here that the latter can transmit instructions to lithography subsystems. Note here that the latter can transmit replies to element control unit. Every said element comprises also the cluster external communication means for interaction with the operator or the main system. Note here the cluster external communication means can output control data to at least one element control unit for control over operation of one or more lithography subsystems for exposure of one or more solid-state plates. Cluster external communication means can output process program to element control unit. Note also that process program includes the set of preset instructions and related parameters. Mind that every instruction corresponds to preset action or sequence of actions to be executed by one or more lithography subsystems. Said parameters will additionally define the way of execution of action or sequence of actions.

EFFECT: simplified processing control system.

15 cl, 13 dwg