FIELD: glass.
SUBSTANCE: invention relates to quartz glass implanted with zinc ions, and can be used in making micro-components (nano-) and optoelectronic devices, particularly microminiature light sources for planar thin-film waveguide systems and optical integrated circuits. Quartz glass is a base of silicon dioxide with modified coating layer containing single-phase inclusion in form of crystalline nanoclusters of Zn2SiO4, which have diameters 4÷10 nm and distributed in surface layer of glass on depths 10÷50 nm. Glass is produced by implantation in a pulsed mode with a pulse duration of 0.3-0.4 ms, pulse repetition frequency 12.5-20 Hz, pulse current density of 0.8-0.9 mA/cm2, dose (4.5-5)·1016 ions/cm2, ion energy of 30-35 keV and temperature of silica of 60-350 °C.
EFFECT: obtained glass is characterised by high specific intensity in green spectral region (500-600 nm).
1 cl, 2 dwg, 1 tbl, 3 ex
| Title | Year | Author | Number | 
|---|---|---|---|
| METHOD FOR PRODUCING SILICA GLASS IMPLANTED WITH ZINC IONS | 2014 | 
 | RU2568456C1 | 
| METHOD OF PRODUCING QUARTZ GLASS IMPLANTED WITH TIN IONS | 2011 | 
 | RU2486282C1 | 
| METHOD TO PRODUCE LUMINISCENT NANO-STRUCTURED COMPOSITE CERAMIC MATERIAL | 2008 | 
 | RU2383579C1 | 
| METHOD OF PRODUCING NANOCOMPOSITE LUMINOPHOR IN FORM OF QUARTZ GLASS CONTAINING COPPER NANOCLUSTERS | 2010 | 
 | RU2443748C1 | 
| METHOD OF PRODUCING NANOCOMPOSITE LUMINOPHORE IN FORM OF QUARTZ GLASS CONTAINING COPPER AND TITANIUM NANOCLUSTERS | 2010 | 
 | RU2453577C2 | 
| TIN ION-IMPLANTED SILICON OXIDE FILM ON SILICON SUBSTRATE | 2013 | 
 | RU2535244C1 | 
| DOPED QUARTZ GLASS WITH TETRAHEDRAL COORDINATION OF TITANIUM ATOMS | 2011 | 
 | RU2477711C1 | 
| DIFFRACTION GRATING | 2013 | 
 | RU2541495C1 | 
| METHOD OF MAKING DIFFRACTION GRATING | 2013 | 
 | RU2544873C1 | 
| METHOD OF PRODUCING DOPED QUARTZ GLASS WITH TETRAHEDRAL COORDINATION OF TITANIUM ATOMS | 2011 | 
 | RU2461665C1 | 
Authors
Dates
2016-05-27—Published
2014-11-24—Filed