METHOD OF MAKING DIFFRACTION GRATING Russian patent published in 2015 - IPC G02B5/18 H01L21/265 H01L21/425 

FIELD: physics.

SUBSTANCE: method of making a diffraction grating includes forming, on the surface of a starting substrate, elements of a given structure of the diffraction grating via ion implantation through a surface mask, wherein implantation is carried out with metal ions with energy of 1100 keV, a radiation dose which provides concentration of metal atoms embedded in the irradiated substrate of 3·10²⁰-6·10²² atoms/cm³, current density of the ion beam of 2·10¹²-1·10¹⁴ ions/cm²s in an optically transparent dielectric or semiconductor substrate.

EFFECT: making diffraction gratings on the surface of optically transparent dielectric or semiconductor materials, characterised by high contrast in coefficients of reflection between separate elements of the grating, which improves diffraction efficiency thereof and enables to use for both reflected and transmitted light.

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