FIELD: chemistry.
SUBSTANCE: invention relates to film-forming solutions (FFS) and a method of production, enabling formation thereof based on thin-film coatings, consisting of titanium dioxide, unmodified and modified with silicon oxides and/or d-metal (Ni, Co, Mn, Fe) with high degree of reproducibility of optical properties of material. Method involves preparation of a film-forming solution with subsequent thermal treatment. Film-forming solution is prepared from butanol, distilled water, d-metal chloride crystalline hydrate, selected from Ni, Co, Mn and Fe, hydrochloric acid, tetrabutoxytitanium and tetraethoxysilane, with subsequent holding of freshly prepared film-forming solution for 3–7 days and its further application onto substrate, drying at 60–80 °C for 1 h and annealing at temperature of 400–900 °C for 1 hour.
EFFECT: providing high degree of reproducibility of physical and chemical properties of material in a wide range of concentrations.
1 cl, 4 dwg, 10 tbl, 8 ex
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Authors
Dates
2017-01-18—Published
2015-10-26—Filed