METHOD OF PRODUCING HIGH-POROUS COATING ON BASIS OF DOUBLE SILICON AND NICKEL OXIDES Russian patent published in 2013 - IPC B05D5/00 C09D183/00 B82B3/00 

FIELD: process engineering.

SUBSTANCE: invention relates to production of thin-film materials base on system of double oxides used fast developing areas of electronic lighting engineering, etc, as sensitive, decorative, filtering and distributing coatings, etc. Proposed method comprises preparing film forming solution and applying it on article surface. Fresh film forming solution is kept for 8-13 days at 6-8°C, drying is performed at 60°C for 30-40 min and nonlinear heating to 800-900°C in air and curing at 800-900°C for one hour and cooled in conditions of natural cooling down of muffle furnace at the following ratio of components in film forming solutions in wt %: tetraethoxysilane - 22.6-21.4; hydrochloric acid - 4.4-10^-4-1.2-10^-4, distilled water - 2.3-0; metal salt - NiCl₂-6H₂O 1.1- 8.4; ethanol - (98 wt %) making the rest.

EFFECT: simplified production of uniform coating with perfected properties.

2 ex, 1 dwg