METHOD OF PRODUCING HIGHLY POROUS COATING BASED ON SILICON AND MANGANESE DOUBLE OXIDES Russian patent published in 2013 - IPC C01B13/18 C01B13/14 C01B33/00 C01B33/113 C01G45/00 B81C3/00 

FIELD: chemistry.

SUBSTANCE: invention relates to the technology of producing highly porous coatings based on double oxide systems used in the fast growing fields of electronics and lighting engineering, production of catalyst materials, as functionally sensitive, decorative, filter and radiation redirecting coatings. The method involves preparing a film-forming solution, followed by deposition thereof onto the surface of substrates, drying, annealing and cooling. The freshly prepared film-forming solution is held for 8-13 days at temperature of 6-8°C; drying is carried out at temperature of 60°C for 30-40 minutes, followed by nonlinear heating to 800-900°C in an air atmosphere; in the first 15-20 minutes, the rate of heating is maximum and is equal to 22°C/min; in the next 17 minutes, the rate of heating is kept at 18°C/min; and then for 12 minutes, the rate of heating is 12°C/min; in the last 40-20 minutes, the rate of heating is kept at 0.5°C/min; and holding is carried out at 800-900°C for 1 hour, with gradual cooling in natural cooling conditions of a muffle furnace, with the following ratio of components of the film-forming solution, wt %: tetraethoxysilane 22.4-21.6, hydrochloric acid 1.3·10^-4-1.2·10^-4, distilled water 3.2-1, metal salt MnCl₂·4H₂O 0.8-6.6, ethyl alcohol (98 vol. %) - the balance.

EFFECT: simple method of producing a highly porous coating, higher coefficient of reflection in the visible wavelength range and transmission coefficient of near ultraviolet radiation, along with a combination of low refraction index and thickness.

1 dwg, 2 ex