FIELD: chemistry.
SUBSTANCE: invention relates to antireflection thin-film oxide coatings based on SiO2, applied on transparent glass for miniature incandescent lamps. The antireflection thin-film coating based on silicon(IV) and bismuth(III) oxide compounds contains a film-forming solution based on ethyl alcohol, tetraethoxysilane in the presence of a sulphuric acid additive. Into the composition of the solution additionally added is an electrolyte - stabiliser being crystalline hydrate of bismuth (III) nitrate with the following component ratio, wt %: tetraethoxysilane - 0.59-6.77; crystalline hydrate of bismuth (III) nitrate - 3.50-24.89; sulphuric acid - 0.01-0.02; ethyl alcohol - the remaining part.
EFFECT: increase of the service term of the film-forming solution.
1 dwg, 3 ex
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