FIELD: technological processes.
SUBSTANCE: invention relates to abrasive processing and can be used for finishing of optical elements. System includes a polishing pad having a radial dimension (r), measured from centre of polishing pad, and a diaphragm arranged on polishing pad and configured to partially surround optical element. Latter is in contact with polishing pad within range of radial dimension. Diaphragm has a shape characterised by peripheral width fs(r) in a direction transverse to optical element, determined depending on radial dimension ensuring constant rate of wear of polishing pad as a function of radial dimension within range of radial dimension.
EFFECT: higher quality of treated surfaces by preventing scratches.
13 cl, 26 dwg, 1 tbl
| Title | Year | Author | Number |
|---|---|---|---|
| NOZZLE PLATE, HEAD OF FLUID OUTLET, DEVICE OF FLUID OUTLET AND DEVICE FOR FLUID OUTLET | 2015 |
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RU2677935C2 |
| DIPHASE SOLUTION OF METHYLMETHACRYLATE-METAACRYLIC ACID COPOLYMER FOR TREATING METALLIC SURFACES | 1996 |
|
RU2122010C1 |
| CERIUM OXIDE ABRASIVE AND SUBSTRATE POLISHING TECHNIQUE | 1997 |
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| ABRASIVE ARTICLES, TOOLS OF RECIPROCATION ROTATION, METHODS | 2008 |
|
RU2471606C2 |
| POLISHING PAD AND METHOD FOR PRODUCTION THEREOF, AS WELL AS A METHOD OF PRODUCING A POLISHED ARTICLE | 2017 |
|
RU2736460C2 |
| ABRASIVE PRODUCTS AND METHODS OF FINISHING SURFACES | 2013 |
|
RU2595788C2 |
| METHOD FOR ELIMINATION OF SCRATCHES AND OTHER DEFECTS FROM PLASTIC SURFACES AND COMPOSITIONS FOR ITS EMBODIMENT | 1993 |
|
RU2113965C1 |
