CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING SAPPHIRE SURFACE AND METHODS OF USING SAME Russian patent published in 2018 - IPC C30B33/00 C30B29/20 C09G1/02 C09K3/14 B24B1/00 B28D5/02 H01L21/461 

FIELD: electricity.

SUBSTANCE: invention relates to a chemical mechanical polishing composition for treating an outer sapphire surface and a method for polishing a sapphire substrate. Disclosed is a method for polishing an outer sapphire substrate using a polishing slurry, comprising as starting components: colloidal silica as an abrasive, where colloidal silica has a negative surface charge and wherein the colloidal silica has a multimodal particle size distribution with a first particle size maximum between 2 and 25 nm and a second particle size maximum between 75 and 200 nm. Polishing slurry may further comprise a pesticide, or a nonionic defoaming agent, or pH regulator.

EFFECT: invention provides fast of leveling the surface of sapphire plates (substrates), resulting in the removal of surface defects, scratches, and damaged layers.

12 cl, 2 tbl