METHOD FOR MEASURING PLANE LOCATION DEVIATIONS RELATIVE TO CENTER OF OUTER SPHERICAL SURFACE Russian patent published in 2017 - IPC G01B5/00 

Abstract RU 2619141 C1

FIELD: measuring equipment.

SUBSTANCE: basing element, comprising basing prisms, is mounted on the installation plane. Orienting mechanism is mounted on the basing element, providing a bisector plane perpendicularity of the orienting prism to the common bisector plane of the basing prisms. A reading device is installed on the basing element, ensuring the predetermined flight for its measuring probe against the bisector plane of the orienting prism and the axis location of the measuring probe in the common bisector plane of the basing prisms. The measurement object is installed by the cylindrical surfaces on the basing prisms. The measurement object is oriented along the common bisector plane of the basing prisms by supplying an orienting prism thereto. The first reading device indication is read. The measurement object is repositioned and re-oriented. The second reading device indication is read. The deviations from the set distance value from each of the measured planes to the outer spherical surface center are judged according to the indications, and the symmetry of the measured planes against the said center - according to their half-difference.

EFFECT: improving the accuracy of the plane location deviation measurement against the center of the outer spherical surface.

2 dwg

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RU 2 619 141 C1

Authors

Arkharov Anatolij Pavlovich

Dates

2017-05-12Published

2016-01-11Filed