FIELD: physics.
SUBSTANCE: method for manufacturing the phase diffraction microstructures is that the thin-film titanium layers, deposited on the substrate of the transparent material, with the scanning laser microscope, are affected by the scanning laser rediation that gives rise to the oxide titanium microstructures, the microstructure is formed on the substrate with the topological pattern coated thereon by thermal molybdenum film oxidation with the thickness not less than 15 nm at the temperature of 450-550°C.
EFFECT: providing the possibility of forming the phase microstructure on the substrate surface without the use of ion reactive etching, which reduces the process cycle duration and the number of technological operations.
1 tbl
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