FIELD: electricity.
SUBSTANCE: invention relates to a package of electrodes comprising electrodes stacked stack (71-80) for controlling a beam of charged particles along the optical axis (A), and can be used for the manufacture of semiconductor structures lithography techniques. Each electrode includes an electrode body with an aperture for the charged particle beam. Body mutually spaced electrodes, the apertures of the electrodes are coaxially aligned along the optical axis. Insulating electrode stack comprises distancing structure (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). Each of the first electrode and the second electrode of the electrode body comprises one or more support part (86). Each support portion is configured to be placed in at least one distancing structure (89). The electrodes package has at least one clamping element (91-91c), adapted to fasten the supporting part (86) of the first and second electrodes, and also distancing the intermediate structure (89).
EFFECT: improved accuracy while controlling the beam of charged particles.
27 cl, 15 dwg
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Authors
Dates
2017-06-01—Published
2014-11-14—Filed