METHOD OF GLASS CERAMIC SUBSTRATES CLEANING IN THE LOW PRESSURE HIGH-FREQUENCY PLASMA JET Russian patent published in 2018 - IPC B08B11/04 C03C23/00 

FIELD: technological processes.

SUBSTANCE: invention relates to the glass ceramics substrates cleaning method. Method includes chemical purification and washing in deionized water. After washing in deionized water, the prefabricated glass ceramics substrate is preheated in the high-frequency plasma jet at a distance of 60 to 120 mm from the high-frequency plasmatron cutoff for 1 min to 2 min with the HF generator power from 1,400 W to 1,500 W by changing the process gas flow rate from 0.04 g/s to 0.06 g/s. Then, carrying out the glass ceramics substrates cleaning in a high-frequency plasma jet is for 5 minutes to 10 minutes at a high-frequency generator power from 1,500 W to 1,750 W, plasma forming gas consumption from 0.06 to 0.08 g/s, pressure from 19.0 to 26.6 Pa, followed by a smooth decrease in gas flow rate from 0.06 g/s to 0.04 g/s for 1 minute up to 2 min.

EFFECT: method provides obtaining of the glass ceramic substrates clean hydrophilic surface without contamination in the form of separate particles or as a film.

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