METHOD OF REMOVING ORGANIC RESIDUE FROM PIEZOELECTRIC SUBSTRATES Russian patent published in 2010 - IPC C23G5/00 C23F4/00 H01L21/3065 H01L41/22 

FIELD: chemistry.

SUBSTANCE: method involves evacuation and treating substrates in oxygen-containing plasma. Substrates are treated in a plasma mixture of oxygen and inert gas containing 5-12 vol. % oxygen and 88-95 vol. % inert gas. The inert gas is helium, neon or argon and treatment is carried out at temperature in the reaction chamber equal to 80-140 Pa, radio-frequency power equal to 0.02-0.06 W/cm³ and exposure time of 3-15 minutes.

EFFECT: invention improves electrophysical parametres of piezoelectric devices owing to more complete removal of organic residue from piezoelectric substrates after different processes.

3 ex