METHOD FOR OBTAINING THIN FILMS OF LITHIUM NIOBATE ON SUBSTRATE Russian patent published in 2021 - IPC C23C14/08 C23C14/35 

FIELD: lithium niobate films production.

SUBSTANCE: invention relates to a method for producing lithium niobate films with ferroelectric properties for use in optoelectronic devices, acoustoelectronics, micro-, nanoelectronics and spintronics. A method for producing a thin film of lithium niobate on a silicon substrate includes high-frequency magnetron sputtering of a lithium niobate target, which is a cathode, in a working gas atmosphere onto a silicon substrate. Sputtering of the target is carried out on a silicon substrate heated to 550°C at a specific power of a high-frequency discharge from 15 to 35 W⋅cm², released by a magnetron, for 10-360 min. The silicon substrate is placed parallel to the specified target at a distance of 45-55 mm above the target erosion zone in the region in which the energy effect of the plasma on the silicon substrate is maximal. Ar or a mixture of Ar and O₂ are used as a working gas.

EFFECT: simplification of fabrication of structures consisting of a substrate and a thin compact, textured crystalline coating of lithium niobate with an elemental composition corresponding to LiNbO₃.

1 cl, 2 dwg, 1 ex