FIELD: chemistry.
SUBSTANCE: invention relates to chemistry and can be used in the field of piestic- and optoelectronics. Method for producing bismuth silicate Bi12SiO20 by crystallization method in crubicle includes preliminary mechanical mixing of the initial bismuth oxide powders Bi2O3 and silicon oxide SiO2, heating of resulting mixture in platinum crucible up to 985±10 °C – 1,250±10 °C to obtain melt with a holding time of not less than 15 minutes, cooling of melt in a crucible up to 900±10 °C – 953±10 °C with isothermal holding in this temperature range for at least 15 minutes and further in air at cooling rate of 3–200 °C/min. A single-phase Bi12SiO20 in form of grains having dendritic form are obtained.
EFFECT: this material has high response rate and high sensitivity.
1 cl, 4 dwg
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Authors
Dates
2018-09-03—Published
2017-12-14—Filed