SYSTEM AND METHOD OF FORMING WAFERS BLOCKS Russian patent published in 2018 - IPC A21C15/00 

Abstract RU 2671692 C2

FIELD: equipment for production or processing of dough.

SUBSTANCE: group of inventions relates to a system and method for forming wafer blocks (1). Wafer blocks (1) comprise at least three wafer sheets (2) and at least two cream layers (3) consisting of two different creams, wherein wafer sheets (2) and cream layers (3) are arranged alternately and lying in parallel on top of each other. System for forming wafer blocks (1) comprises input station (4) in which individual wafer sheets (2), preferably from a wafer oven, are successively fed into the system, first conveying surface (5) for conveying first wafer sheets (2a), wherein first covering station (6) is provided along first conveying surface (5) for applying first cream layer (3a) from a first cream onto first wafer sheets (2a), second conveying surface (7) for conveying second wafer sheets (2b), wherein second covering station (8) for applying second cream layer (3b) of a second cream onto second wafer sheets (2b) is provided along said second conveying surface (7), third conveying surface (9) for conveying third wafer sheets (2c), stacking station (10) on which first wafer sheets (2a) with their first cream layer (3a), second wafer sheets (2b) with their second cream layer (3b) and third wafer sheets (2c) are stacked to form one or more wafer blocks (1), input switching mechanism (11) by which wafer sheets (2) from input station (4), are optionally transferred to first conveying surface (5), second conveying surface (7) or third conveying surface (9), and output switching mechanism (12), by means of which wafer sheets (2) from first conveying surface (5), second conveying surface (7) or third conveying surface (9), in accordance with the selection, are transferred to stacking station (10).

EFFECT: group of inventions provides formation of wafer blocks with at least two cream layers of two different creams with increased efficiency and the ability to select the sequence and number of cream layers.

29 cl, 2 dwg

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RU 2 671 692 C2

Authors

Dolkowski Michael

Haas Johannes

Haas Josef

Jiraschek Stefan

Kreiner Florian

Reithner Jurgen

Dates

2018-11-06Published

2015-04-28Filed