FIELD: technological processes.
SUBSTANCE: invention relates to the manufacture of sprayable composite targets of Co2MnSi Heusler alloy, which can be used in the production of microelectronics. Method involves mechanical mixing of the powders of the alloy components to obtain a homogeneous powder mixture and sintering it. Sintering the powder mixture is carried out by the method of electropulse plasma sintering in a graphite mold at a temperature of 600 °C and a minimum pressure of 2.5 kN by passing sequences of DC pulses of 5,000 A with a pulse duration of 3.3 ms through the filling of the powder mixture to obtain a composite target. Target porosity is monitored based on the data of the dilatometric shrinkage curve.
EFFECT: mechanically strong, not oxidized, composite targets of an alloy with a porosity in the range of 10–30 % are obtained.
1 cl, 3 dwg, 1 ex
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Authors
Dates
2019-01-28—Published
2017-11-07—Filed