FIELD: electrical engineering.
SUBSTANCE: invention relates to a matrix substrate and a method for production thereof. Method of making a matrix substrate includes: depositing a conductive layer on a substrate and using a first mask for etching the conductive layer to form three electrodes of a thin-film transistor, a first signal line and a second signal line, wherein first signal line comprises first part and second part, separated and located on each side of second signal line, successive deposition of intermediate layers and use of second mask during etching of intermediate words with formation of first connecting bridge, connecting first part and second part, depositing a conductive electrode and using a third mask when etching the conductive electrode to form a pixel electrode and a connecting line electrically connected to the first portion and the second portion.
EFFECT: thus, time consumed for fabrication of matrix substrate, and manufacturing costs are reduced.
20 cl, 9 dwg
