FIELD: manufacturing technology.
SUBSTANCE: invention relates to production of a plasmon film structure based on aluminum. Proposed method comprises laser processing of billet arranged on dielectric substrate in vacuum chamber with optically transparent window. As a workpiece there used is a layer of powder based on aluminum alloy, which is placed on a substrate, laser layer treatment by means of laser radiation is carried out in two stages when substrate and workpiece move in horizontal plane in two perpendicular directions. At the first stage, a layer of powder is pre-compacted on the substrate in the absence of melting by raster scanning of the surface of the layer along a given trajectory with pulsed laser radiation to obtain a packed layer with thickness of 150–600 mcm. At the second stage selective laser melting of the layer sealed on the substrate along the specified trajectory by means of pulsed laser radiation is performed to produce a fused plasmon film structure with thickness of 50–100 mcm.
EFFECT: obtaining a plasmon film structure with a relief period of 10–250 mcm owing to the use of powders of additive production as initial material.
5 cl, 1 dwg, 2 tbl
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Authors
Dates
2019-05-28—Published
2017-12-28—Filed