FIELD: optics.
SUBSTANCE: invention relates to production of multilayer substrate for light-emitting device. Method comprises the following steps: (a) providing a glass substrate having a refraction index at 550 nm of 1.45–1.65, (b) depositing a coating in the form of a metal oxide layer on one side of the glass substrate, wherein the metal oxide is selected from a group consisting of TiO2, Al2O3, ZrO2, Nb2O5, HfO2, Ta2O5, WO3, Ga2O3, In2O3 and SnO2 and mixtures thereof, (c) applying a coating in form of a glass frit having a refraction index at 550 nm from 1.70 to 2.20, onto said metal oxide layer, said glass frit comprising, at least 30 wt. % and at most 75 wt. % Bi2O3, (d) annealing the obtained coated glass substrate at temperature of 530–620 °C. As a result of annealing, the metal oxide reacts with the melting glass frit and forms an enamel layer with a high refraction index, with a plurality of spherical voids embedded in the lower portion of the enamel layer near the interface with the glass substrate.
EFFECT: technical result is improved surface quality of hardened enamel with high refraction index, without crater-like recesses caused by hardened open bubbles.
12 cl, 3 dwg, 1 tbl, 1 ex
