FIELD: metallurgy.
SUBSTANCE: invention relates to production of relief image on metal base. Method involves formation of a resist pattern on the surface of the base and etching of metal sections which are not protected by resist. In the method, on a metal base having an electrode potential which is more negative than the electrode potential of copper, copper or its alloy is deposited as a resist, and etching is carried out in solution, providing dissolution of areas not protected by resist mainly due to reaction of contact exchange between base metal and copper ions.
EFFECT: invention improves the quality of the obtained image by reducing the through-treatment of the base metal through the pores of the resist and reduces the cost of making the articles owing to the possibility of using metal-resistors in the form of immersion precipitation.
5 cl, 3 ex
