MICROMECHANICAL COMPONENT, CHARACTERIZED BY REDUCED SURFACE OF CONTACT, AND METHOD FOR MANUFACTURING THEREOF Russian patent published in 2019 - IPC G04B17/00 

Abstract RU 2707712 C1

FIELD: microstructure technology.

SUBSTANCE: invention relates to a silicon-based component characterized by at least one reduced contact surface which, obtained by using a method combining at least one step of etching the inclined sidewall with etching of vertical side walls from Bosch, improves, in particular, tribology of components obtained as a result of mechanical micromachining of plate on silicon base.

EFFECT: invention discloses a micromechanical component characterized by a reduced contact surface and a method for production thereof.

8 cl, 12 dwg

Similar patents RU2707712C1

Title Year Author Number
SILICON-BASED COMPONENT HAVING AT LEAST ONE CHAMFER AND A METHOD FOR PRODUCTION THEREOF 2016
  • Gandelman Aleks
RU2710522C1
METHOD OF PROFILED SILICON STRUCTURES MANUFACTURING 2019
  • Pautkin Valerij Evgenevich
  • Mishanin Aleksandr Evgenevich
  • Krajnova Olga Mikhajlovna
  • Lifanova Aniya Zinnatullovna
RU2730104C1
METHOD FOR ANISOTROPIC PLASMA ETCHING OF SILICON MICROSTRUCTURES IN NITRIDIZATION AND ETCHING CYCLIC PROCESS 2022
  • Averin Sergej Nikolaevich
  • Kuzmenko Vitalij Olegovich
  • Lukichev Vladimir Fedorovich
  • Myakonkikh Andrej Valerevich
  • Rudenko Konstantin Vasilevich
  • Semin Yurij Fedorovich
RU2796239C1
METHOD OF ANISOTROPIC PLASMA ETCHING OF SILICON MICROSTRUCTURES IN A CYCLIC TWO-STEP OXIDATION-ETCHING PROCESS 2018
  • Averkin Sergej Nikolaevich
  • Antipov Aleksandr Pavlovich
  • Lukichev Vladimir Fedorovich
  • Myakonkikh Andrej Valerevich
  • Rudenko Konstantin Vasilevich
  • Rylov Aleksej Anatolevich
  • Semin Yurij Fedorovich
RU2691758C1
METHOD OF FORMING DEEPLY PROFILED SILICON STRUCTURES 2018
  • Gusev Evgenij Eduardovich
  • Dyuzhev Nikolaj Alekseevich
  • Koltakov Sergej Vladimirovich
  • Esenkin Kirill Sergeevich
RU2691162C1
ETCHING METHOD AND ETCHING SYSTEM 2005
  • Morikava Jasukhiro
  • Khajasi Tosio
  • Suu Koukou
RU2332749C1
MICROMECHANICAL COMPOSITE ELEMENT AND METHOD OF ITS FABRICATION 2010
  • Kjuzen P'Er
  • T'Ebo Zhan-Filipp
RU2544289C2
METHOD FOR DEEP ANISOTROPIC PLASMA ETCHING OF SILICON STRUCTURES 2024
  • Somov Nikita Mikhajlovich
  • Paramonov Vladislav Vitalevich
  • Putrya Mikhail Georgievich
  • Dyuzhev Nikolaj Alekseevich
  • Chaplygin Yurij Aleksandrovich
  • Golishnikov Aleksandr Anatolevich
  • Krupkina Tatyana Yurevna
  • Losev Vladimir Vyacheslavovich
  • Osipova Tatyana Viktorovna
  • Potapenko Ilya Viktorovich
RU2824746C1
METHOD FOR MANUFACTURING A MATRIX OF FIELD-EMISSION TUBULAR CATHODES BASED ON DOPED NANOCRYSTALLINE DIAMOND FILMS 2022
  • Vikharev Anatolij Leontevich
  • Bogdanov Sergej Aleksandrovich
  • Okhapkin Andrej Igorevich
  • Ukhov Anton Nikolaevich
  • Filatov Evgenij Aleksandrovich
RU2784410C1
METHOD FOR PRODUCING SUBMICRON AND NANOMETRIC STRUCTURE 2005
  • Amirov Il'Dar Iskanderovich
  • Morozov Oleg Valentinovich
RU2300158C1

RU 2 707 712 C1

Authors

Gandelman Aleks

Pen Andre

Dates

2019-11-28Published

2016-06-24Filed