SILICON-BASED COMPONENT HAVING AT LEAST ONE CHAMFER AND A METHOD FOR PRODUCTION THEREOF Russian patent published in 2019 - IPC B81C99/00 B81B1/00 

FIELD: watches and other time measuring instruments.

SUBSTANCE: use: to create a micromechanical component. Essence of the invention consists in that the method of making the micromechanical component obtained from the silicon-based material involves the following steps: a) providing a silicon-based substrate; b) forming a hole-permeable mask on a horizontal portion of the substrate; c) etching in the etching chamber of the predetermined inclined walls on a portion of the thickness of the substrate from the openings in the mask in order to form the upper end faces of the micromechanical component; d) etching in said etching chamber substantially vertical walls (47) at least a portion of the thickness of the substrate from the bottom of the region, which is the result of etching obtained at step c), in order to produce peripheral walls of micromechanical component under upper chamfering surfaces; e) releasing micromechanical component from substrate and mask.

EFFECT: technical result is enabling improvement of mechanical strength of components.

14 cl, 18 dwg