FIELD: chemistry.
SUBSTANCE: invention can be used in chemical industry. Method of decomposing a chlorosilane polymer formed secondary at the step of chemical vapour deposition using a chlorosilane-based gas includes a step of bringing a lower alcohol, such as butanol or a lower alcohol, into contact with a chlorosilane polymer at low pressure or in an inert gas. Chlorosilane polymer is decomposed to an alkoxide, hydrogen chloride and hydrogen and the alkoxide, hydrogen chloride and hydrogen are diluted with said alcohol. Further, an alkoxide hydrolysis step is carried out.
EFFECT: invention prevents formation of explosive solid chlorosilane polymer and adhesion of silica formed from liquid chlorosilane polymer to inner parts of used equipment.
4 cl, 5 dwg, 2 ex
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD OF OBTAINING FINE SILICA | 2010 |
|
RU2447020C1 |
| GAS SEPARATION MEMBRANE WITH SILICON DIOXIDE-BASED LAYER DOPED WITH TERVALENT ELEMENT | 2006 |
|
RU2418622C2 |
| PROCEDURE FOR FORMING LAYER OF POLY-CRYSTALLINE SILICON ON CORE BASE | 2010 |
|
RU2428525C1 |
| DEVICE FOR SELECTION BY REPEATED HEATING FOR GAS-PHASE PROCESS | 2017 |
|
RU2724260C1 |
| SOL-GEL METHOD FOR PREPARATION OF LARGE-SIZE DRY GELS AND MODIFIED GLASSES | 2001 |
|
RU2278079C2 |
| METHOD OF PRODUCING TRICHLOROSILANE | 2008 |
|
RU2394762C2 |
| APPARATUS FOR PRODUCING TRICHLOROSILANE AND METHOD OF PRODUCING TRICHLOROSILANE | 2009 |
|
RU2496715C2 |
| METHOD OF PROCESSING INORGANIC SILICATES AND SILICA-CONTAINING STOCK | 2006 |
|
RU2319665C1 |
| PRODUCTION OF SILICON IN FLUIDISED BED REACTOR WITH USE OF TETRACHLOROSILANE FOR DECREASING SEDIMENTATION AT REACTOR WALLS | 2009 |
|
RU2518613C2 |
| METHOD OF PRODUCING MESOPOROUS AMORPHOUS COMPOSITE ELEMENTOSILICATES | 2009 |
|
RU2420455C1 |
