FIELD: chemistry.
SUBSTANCE: invention can be used in chemical industry. Method of decomposing a chlorosilane polymer formed secondary at the step of chemical vapour deposition using a chlorosilane-based gas includes a step of bringing a lower alcohol, such as butanol or a lower alcohol, into contact with a chlorosilane polymer at low pressure or in an inert gas. Chlorosilane polymer is decomposed to an alkoxide, hydrogen chloride and hydrogen and the alkoxide, hydrogen chloride and hydrogen are diluted with said alcohol. Further, an alkoxide hydrolysis step is carried out.
EFFECT: invention prevents formation of explosive solid chlorosilane polymer and adhesion of silica formed from liquid chlorosilane polymer to inner parts of used equipment.
4 cl, 5 dwg, 2 ex
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