FIELD: physical chemistry.
SUBSTANCE: invention relates to a method for the orderly deposition of nanostructured carbon thin films in a constant electric field. A metal grid is placed between a transparent solid substrate and a carbon target, and a potential difference is created between the carbon target and the metal grid. Deposition of ablated particles on the substrate is carried out in a constant electric field with a strength of 105-108 V/m. In the deposition process, the polarity and the magnitude of the potential difference between the carbon target and the metal grid and the distance from the carbon target to the focusing grid and from the grid to the substrate are changed.
EFFECT: method makes it possible to obtain films of a pre-determined morphology according to varying deposition conditions, which actively affects the optical and electrophysical properties of the resulting metasurfaces.
1 cl, 5 dwg
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