CONTROLLED METHOD FOR DEPOSITING CHROMIUM OR CHROMIUM ALLOY LAYER ON AT LEAST ONE SUBSTRATE Russian patent published in 2021 - IPC C25D3/06 

Abstract RU 2758651 C2

FIELD: electroplating equipment.

SUBSTANCE: method includes stages of (a) providing an aqueous precipitation bath, wherein the bath contains trivalent chromium ions, bromide ions, alkali metal cations in the total amount from 0 mol/l to 1 mol/l per the total volume of the precipitation bath, and the bath has target pH in the range from 4.1 to 7.0, (b) providing the specified at least one substrate and at least one anode, (c) immersing the specified at least one substrate in the aqueous precipitation bath and supplying direct electric current so that a chromium or chromium alloy layer is deposited on substrate, which is cathode, wherein, during or after stage (c), pH of the precipitation bath is lower than target pH, (d) adding NH4OH and/or NH3 during or after stage (c) to the precipitation bath so that target pH of the precipitation bath is restored.

EFFECT: obtaining a chromium layer or a chromium alloy layer with average roughness of less than 0.5 mcm, excellent hardness and wear resistance during long-term operation of the precipitation bath.

15 cl, 2 dwg, 2 tbl, 2 ex

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RU 2 758 651 C2

Authors

Walter, Anke

Yevtushenko, Oleksandra

Paulig, Franziska

Dates

2021-11-01Published

2018-04-04Filed